Growth and characterization of Na0.5K0.5NbO3 thin films on polycrystalline Pt80Ir20 substrates

Xin Wang, Sveinn Olafsson, Lynnette D. Madsen, Staffan Rudner, Ivan P. Ivanov, Alex Grishin, Ulf Helmersson

Rannsóknarafurð: Framlag til fræðitímaritsGreinritrýni

27 Tilvitnanir (Scopus)

Útdráttur

Na0.5K0.5NbO3 thin films have been deposited onto textured polycrystalline Pt80Ir20 substrates using radio frequency magnetron sputtering. Films were grown in off- and on-axis positions relative to the target at growth temperatures of 500-700°C and sputtering pressures of 1-7 Pa. The deposited films were found to be textured, displaying a mixture of two orientations (001) and (101). Films grown on-axis showed a prefered (001) orientation, while the off-axis films had a (101) orientation. Scanning electron microscopy showed that the morphology of the films was dependent on the substrate position and sputtering pressure. The low-frequency (10 kHz) dielectric constants of the films were found to be in the range of approximately 490-590. Hydrostatic piezoelectric measurements showed that the films were piezoelectric in the as-deposited form with a constant up to 14.5 pC/N.

Upprunalegt tungumálEnska
Síður (frá-til)1183-1191
Síðufjöldi9
FræðitímaritJournal of Materials Research
Bindi17
Númer tölublaðs5
DOI
ÚtgáfustaðaÚtgefið - maí 2002

Athugasemd

Funding Information:
Financial support from the Swedish National Board for Industrial and Technical Development (NUTEK) and the Swedish Foundation for Strategic Research through the Superconductivity Consortium is greatly appreciated. Dr. Björgvin Hjörvarsson and Dr. Sergey Khartsev are thanked for their assistance with RBS analysis and temperature measurements of dielectric properties, respectively.

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