A global model study of low pressure high density CF4 discharge

D. A. Toneli, R. S. Pessoa, M. Roberto, J. T. Gudmundsson

Rannsóknarafurð: Framlag til fræðitímaritsYfirlitsgreinritrýni

3 Tilvitnanir (Scopus)

Útdráttur

We present a revised reaction set for low pressure high density CF4 plasma modelling. A global model (volume averaged) was developed to study a CF4 discharge that includes the neutral species CF4, CF3, CF2, CF, F2, F, and C, the metastable states CF(a4Σ-) and CF2(3B1), the positive ions , , CF+, , F+, and C+, the negative ions , , and F-, and electrons. The main reactions that contribute to the production and loss of each species are pointed out with an emphasis on the radicals CF2, CF and F, the dominant positive ion , and the dominant negative ion F-. We find wall processes to have a significant influence on the discharge. The density of F2 is high due to recombination of F atoms at the walls and the losses of the radicals F, CF, and CF3 are mainly through wall recombination. As the pressure is increased, F- becomes the dominant negative charged species. The discharge is found to be weakly electronegative below ∼10 mTorr and the electronegativity decreases with increased absorbed power.

Upprunalegt tungumálEnska
Númer greinar025007
FræðitímaritPlasma Sources Science and Technology
Bindi28
Númer tölublaðs2
DOI
ÚtgáfustaðaÚtgefið - 25 feb. 2019

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© 2019 IOP Publishing Ltd.

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