Properties of epitaxial chromium dioxide films grown by chemical vapor deposition using a liquid precursor

A. Anguelouch*, A. Gupta, Gang Xiao, G. X. Miao, D. W. Abraham, S. Ingvarsson, Y. Ji, C. L. Chien

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

20 Citations (Scopus)

Abstract

Epitaxial chromium dioxide (CrO 2) films have been grown using chemical vapor deposition on (100) TiO 2 substrate with chromyl chloride (CrO 2Cl 2) as a liquid precursor. The films are extremely smooth (rms roughness less than 4.6 Å for a 1000-Å-thick film) and have the largest spin polarization (P=98.4%) yet observed, as determined by point contact Andreev reflection. Magnetization switching properties of the films are close to those of a single-domain particle. Preliminary results on the in situ growth of exchange-biased CrO 2/Cr 2O 3 multilayers are also reported. Although a bias field is observed, it is much smaller in comparison with the coercivity of the CrO 2 film.

Original languageEnglish
Pages (from-to)7140-7142
Number of pages3
JournalJournal of Applied Physics
Volume91
Issue number10 I
DOIs
Publication statusPublished - 15 May 2002

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