Morphology of tantalum nitride thin films grown on fused quartz by reactive high power impulse magnetron sputtering (HiPIMS)

D. O. Thorsteinsson; T. K. Tryggvason; J. T. Gudmundsson

doi:10.1557/opl.2015.518

Morphology of tantalum nitride thin films grown on fused quartz by reactive high power impulse magnetron sputtering (HiPIMS)

D. O. Thorsteinsson, T. K. Tryggvason, J. T. Gudmundsson

Faculty of Physical Sciences

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

Abstract

Thin tantalum nitride films were grown on fused quartz by reactive high power impulse magnetron sputtering (HiPIMS) while varying the fractional N2 flow rate at fixed substrate temperature of 400°C. The film properties were compared to films grown by conventional dc magnetron sputtering (dcMS) at similar conditions. Structural characterization was carried out using X-ray diffraction and reflection methods. The HiPIMS process produces slightly less dense films than does dcMS and the surface roughness is similar for both the HiPIMS and dcMS grown films. The deposition rate for HiPIMS is up to 80 % lower than for dcMS but it can be roughly doubled by lowering the magnetic field strength by 30 %.

Original language	English
Title of host publication	Plasma-Based Materials Science and Engineering
Editors	M. Sankaran, D. Horwat, C. Clavero, R. Gago
Publisher	Materials Research Society
Pages	21-26
Number of pages	6
ISBN (Electronic)	9781510826564
DOIs	https://doi.org/10.1557/opl.2015.518
Publication status	Published - 2015
Event	2015 MRS Spring Meeting - San Francisco, United States Duration: 6 Apr 2015 → 10 Apr 2015

Publication series

Name	Materials Research Society Symposium Proceedings
Volume	1803
ISSN (Print)	0272-9172

Conference

Conference	2015 MRS Spring Meeting
Country/Territory	United States
City	San Francisco
Period	6/04/15 → 10/04/15

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Publisher Copyright:
© 2015 Materials Research Society.

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10.1557/opl.2015.518

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Thorsteinsson, D. O., Tryggvason, T. K., & Gudmundsson, J. T. (2015). Morphology of tantalum nitride thin films grown on fused quartz by reactive high power impulse magnetron sputtering (HiPIMS). In M. Sankaran, D. Horwat, C. Clavero, & R. Gago (Eds.), Plasma-Based Materials Science and Engineering (pp. 21-26). (Materials Research Society Symposium Proceedings; Vol. 1803). Materials Research Society. https://doi.org/10.1557/opl.2015.518

Thorsteinsson, D. O. ; Tryggvason, T. K. ; Gudmundsson, J. T. / Morphology of tantalum nitride thin films grown on fused quartz by reactive high power impulse magnetron sputtering (HiPIMS). Plasma-Based Materials Science and Engineering. editor / M. Sankaran ; D. Horwat ; C. Clavero ; R. Gago. Materials Research Society, 2015. pp. 21-26 (Materials Research Society Symposium Proceedings).

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title = "Morphology of tantalum nitride thin films grown on fused quartz by reactive high power impulse magnetron sputtering (HiPIMS)",

abstract = "Thin tantalum nitride films were grown on fused quartz by reactive high power impulse magnetron sputtering (HiPIMS) while varying the fractional N2 flow rate at fixed substrate temperature of 400°C. The film properties were compared to films grown by conventional dc magnetron sputtering (dcMS) at similar conditions. Structural characterization was carried out using X-ray diffraction and reflection methods. The HiPIMS process produces slightly less dense films than does dcMS and the surface roughness is similar for both the HiPIMS and dcMS grown films. The deposition rate for HiPIMS is up to 80 % lower than for dcMS but it can be roughly doubled by lowering the magnetic field strength by 30 %.",

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Thorsteinsson, DO, Tryggvason, TK & Gudmundsson, JT 2015, Morphology of tantalum nitride thin films grown on fused quartz by reactive high power impulse magnetron sputtering (HiPIMS). in M Sankaran, D Horwat, C Clavero & R Gago (eds), Plasma-Based Materials Science and Engineering. Materials Research Society Symposium Proceedings, vol. 1803, Materials Research Society, pp. 21-26, 2015 MRS Spring Meeting, San Francisco, United States, 6/04/15. https://doi.org/10.1557/opl.2015.518

Morphology of tantalum nitride thin films grown on fused quartz by reactive high power impulse magnetron sputtering (HiPIMS). / Thorsteinsson, D. O.; Tryggvason, T. K.; Gudmundsson, J. T.
Plasma-Based Materials Science and Engineering. ed. / M. Sankaran; D. Horwat; C. Clavero; R. Gago. Materials Research Society, 2015. p. 21-26 (Materials Research Society Symposium Proceedings; Vol. 1803).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

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AB - Thin tantalum nitride films were grown on fused quartz by reactive high power impulse magnetron sputtering (HiPIMS) while varying the fractional N2 flow rate at fixed substrate temperature of 400°C. The film properties were compared to films grown by conventional dc magnetron sputtering (dcMS) at similar conditions. Structural characterization was carried out using X-ray diffraction and reflection methods. The HiPIMS process produces slightly less dense films than does dcMS and the surface roughness is similar for both the HiPIMS and dcMS grown films. The deposition rate for HiPIMS is up to 80 % lower than for dcMS but it can be roughly doubled by lowering the magnetic field strength by 30 %.

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Thorsteinsson DO, Tryggvason TK, Gudmundsson JT. Morphology of tantalum nitride thin films grown on fused quartz by reactive high power impulse magnetron sputtering (HiPIMS). In Sankaran M, Horwat D, Clavero C, Gago R, editors, Plasma-Based Materials Science and Engineering. Materials Research Society. 2015. p. 21-26. (Materials Research Society Symposium Proceedings). doi: 10.1557/opl.2015.518

Morphology of tantalum nitride thin films grown on fused quartz by reactive high power impulse magnetron sputtering (HiPIMS)

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