High power impulse magnetron sputtering: Fundamentals, technologies, challenges and applications

Daniel Lundin, Jon Tomas Gudmundsson, Tiberiu Minea

Research output: Book/ReportBookpeer-review

6 Citations (Scopus)

Abstract

High Power Impulse Magnetron Sputtering: Fundamentals, Technologies, Challenges and Applications is an in-depth introduction to HiPIMS that emphasizes how this novel sputtering technique differs from conventional magnetron processes in terms of both discharge physics and the resulting thin film characteristics. Ionization of sputtered atoms is discussed in detail for various target materials. In addition, the role of self-sputtering, secondary electron emission and the importance of controlling the process gas dynamics, both inert and reactive gases, are examined in detail with an aim to generate stable HiPIMS processes. Lastly, the book also looks at how to characterize the HiPIMS discharge, including essential diagnostic equipment. Experimental results and simulations based on industrially relevant material systems are used to illustrate mechanisms controlling nucleation kinetics, column formation and microstructure evolution.

Original languageEnglish
PublisherElsevier
Number of pages384
ISBN (Electronic)9780128124543
ISBN (Print)9780128124550
DOIs
Publication statusPublished - 1 Jan 2019

Bibliographical note

Publisher Copyright:
© 2020 Elsevier Inc. All rights reserved.

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