Experimental studies of O2/Ar plasma in a planar inductive discharge

J. T. Gudmundsson*, Takashi Kimura, M. A. Lieberman

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

90 Citations (Scopus)

Abstract

A Langmuir probe was used to determine the electron density, electron temperature, plasma potential and the electron energy probability function (EEPF) in O2/Ar plasma in a planar inductive discharge for a pressure range of 2-30 mTorr. The electron density increases with increased argon content and increases more steeply with increased argon content after the fractional argon flowrate has reached 50%. The measured dc plasma potential and the average electron energy gradually decrease with increased argon content. Mass spectroscopy indicates that the [O2+]/[O+] ratio increases with increased pressure and decreases with increased fractional argon flowrate. The measured values are compared to global model (volume averaged) calculations assuming a Maxwellian electron energy distribution.

Original languageEnglish
Pages (from-to)22-30
Number of pages9
JournalPlasma Sources Science and Technology
Volume8
Issue number1
DOIs
Publication statusPublished - 1999

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