Dissociative electron attachment to bromotrifluoromethane

Ragesh Kumar Tp, Benedikt Ómarsson, Stefán P. Kristinsson, Oddur Ingólfsson*

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

1 Citation (Scopus)

Abstract

Here we present a study on dissociative electron attachment (DEA) to bromotrifluoromethane, CF3Br, in the energy range from 0 to 10 eV. The dominating process observed is the formation of Br- close to 0 eV incident electron energy. The fragment ion Br- is also observed through a broad contribution from about 3 to 5 eV. In this energy range, F-, FBr- and CF2Br- are also observed, and in the Br- and F- ion yield, a weak contribution is observed close to 8.1 eV. For the DEA processes we calculate the thermochemical thresholds using conventional DFT methods, and the results are discussed in context to these, earlier work and the assignment of the underlying resonances.

Original languageEnglish
Pages (from-to)78-82
Number of pages5
JournalInternational Journal of Mass Spectrometry
Volume387
DOIs
Publication statusPublished - 15 Aug 2015

Bibliographical note

Publisher Copyright:
© 2015 Elsevier B.V. All rights reserved.

Other keywords

  • Bromotrifluoromethane
  • CFBr
  • DEA
  • Dissociative electron attachment

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