Current-voltage-time characteristics of the reactive Ar/O 2 high power impulse magnetron sputtering discharge

Fridrik Magnus; Tryggvi K. Tryggvason; Sveinn Olafsson; Jon T. Gudmundsson

doi:10.1116/1.4732735

Current-voltage-time characteristics of the reactive Ar/O ₂ high power impulse magnetron sputtering discharge

Fridrik Magnus^*, Tryggvi K. Tryggvason, Sveinn Olafsson, Jon T. Gudmundsson

^*Corresponding author for this work

University of Iceland, Iceland

Research output: Contribution to journal › Article › peer-review

33 Citations (Scopus)

Abstract

The discharge current-voltage-time waveforms are studied in the reactive Ar/O ₂ high power impulse magnetron sputtering discharge with a titanium target for 400 μs long pulses. The discharge current waveform is highly dependent on both the pulse repetition frequency and discharge voltage and the current increases with decreasing frequency or voltage. The authors attribute this to an increase in the secondary electron emission yield during the self-sputtering phase of the pulse, as an oxide forms on the target.

Original language	English
Article number	050601
Journal	Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Volume	30
Issue number	5
DOIs	https://doi.org/10.1116/1.4732735
Publication status	Published - Sept 2012

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title = "Current-voltage-time characteristics of the reactive Ar/O 2 high power impulse magnetron sputtering discharge",

abstract = "The discharge current-voltage-time waveforms are studied in the reactive Ar/O 2 high power impulse magnetron sputtering discharge with a titanium target for 400 μs long pulses. The discharge current waveform is highly dependent on both the pulse repetition frequency and discharge voltage and the current increases with decreasing frequency or voltage. The authors attribute this to an increase in the secondary electron emission yield during the self-sputtering phase of the pulse, as an oxide forms on the target.",

author = "Fridrik Magnus and Tryggvason, {Tryggvi K.} and Sveinn Olafsson and Gudmundsson, {Jon T.}",

note = "Funding Information: This work was partially supported by the Icelandic Research Fund Grant No. 072105003 and the University of Iceland Research Fund. The authors acknowledge useful discussions within COST action MP0804.",

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AU - Tryggvason, Tryggvi K.

AU - Olafsson, Sveinn

AU - Gudmundsson, Jon T.

N1 - Funding Information: This work was partially supported by the Icelandic Research Fund Grant No. 072105003 and the University of Iceland Research Fund. The authors acknowledge useful discussions within COST action MP0804.

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N2 - The discharge current-voltage-time waveforms are studied in the reactive Ar/O 2 high power impulse magnetron sputtering discharge with a titanium target for 400 μs long pulses. The discharge current waveform is highly dependent on both the pulse repetition frequency and discharge voltage and the current increases with decreasing frequency or voltage. The authors attribute this to an increase in the secondary electron emission yield during the self-sputtering phase of the pulse, as an oxide forms on the target.

AB - The discharge current-voltage-time waveforms are studied in the reactive Ar/O 2 high power impulse magnetron sputtering discharge with a titanium target for 400 μs long pulses. The discharge current waveform is highly dependent on both the pulse repetition frequency and discharge voltage and the current increases with decreasing frequency or voltage. The authors attribute this to an increase in the secondary electron emission yield during the self-sputtering phase of the pulse, as an oxide forms on the target.

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Current-voltage-time characteristics of the reactive Ar/O 2 high power impulse magnetron sputtering discharge

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Current-voltage-time characteristics of the reactive Ar/O ₂ high power impulse magnetron sputtering discharge