Current-voltage-time characteristics of the reactive Ar/O 2 high power impulse magnetron sputtering discharge

Fridrik Magnus*, Tryggvi K. Tryggvason, Sveinn Olafsson, Jon T. Gudmundsson

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

33 Citations (Scopus)

Abstract

The discharge current-voltage-time waveforms are studied in the reactive Ar/O 2 high power impulse magnetron sputtering discharge with a titanium target for 400 μs long pulses. The discharge current waveform is highly dependent on both the pulse repetition frequency and discharge voltage and the current increases with decreasing frequency or voltage. The authors attribute this to an increase in the secondary electron emission yield during the self-sputtering phase of the pulse, as an oxide forms on the target.

Original languageEnglish
Article number050601
JournalJournal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Volume30
Issue number5
DOIs
Publication statusPublished - Sept 2012

Bibliographical note

Funding Information:
This work was partially supported by the Icelandic Research Fund Grant No. 072105003 and the University of Iceland Research Fund. The authors acknowledge useful discussions within COST action MP0804.

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