A combined gas-phase dissociative ionization, dissociative electron attachment and deposition study on the potential FEBID precursor [Au(CH3)2Cl]2

Elif Bilgilisoy, Ali Kamali, Thomas Xaver Gentner, Gerd Ballmann, Sjoerd Harder, Hans Peter Steinrück, Hubertus Marbach*, Oddur Ingólfsson*

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

Abstract

Motivated by the potential of focused-electron-beam-induced deposition (FEBID) in the fabrication of functional gold nanostructures for application in plasmonic and detector technology, we conducted a comprehensive study on [Au(CH3)2Cl]2 as a potential precursor for such depositions. Fundamental electron-induced dissociation processes were studied under single collision conditions, and the composition and morphology of FEBID deposits fabricated in an ultrahigh-vacuum (UHV) chamber were explored on different surfaces and at varied beam currents. In the gas phase, dissociative ionization was found to lead to significant carbon loss from this precursor, and about 50% of the chlorine was on average removed per dissociative ionization incident. On the other hand, in dissociative electron attachment, no chlorine was removed from the parent molecule. Contrary to these observations, FEBID in the UHV setup was found to yield a quantitative loss and desorption of the chlorine from the deposits, an effect that we attribute to electron-induced secondary and tertiary reactions in the deposition process. We find this precursor to be stable at ambient conditions and to have sufficient vapor pressure to be suitable for use in HV instruments. More importantly, in the UHV setup, FEBID with [Au(CH3)2Cl]2 yielded deposits with high gold content, ranging from 45 to 61 atom % depending on the beam current and on the cleanliness of the substrates surface.

Original languageEnglish
Pages (from-to)1178-1199
Number of pages22
JournalBeilstein Journal of Nanotechnology
Volume14
DOIs
Publication statusPublished - 2023

Bibliographical note

Publisher Copyright:
© 2023 Bilgilisoy et al.; licensee Beilstein-Institut. License and terms: see end of document. All Rights Reserved.

Other keywords

  • dissociative electron attachment
  • dissociative ionization
  • focused-electron-beam-induced deposition (FEBID)
  • gold deposit
  • low-energy electrons
  • quantum chemical calculation
  • ultrahigh vacuum

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